Improvements of the Single Angle Overlap Josephson Junction Technology for Qubit Application

We develop a fully complementary metal-oxide semiconductor (CMOS) fabrication technique for the realization of a superconducting qubit network (SQN). In our current research work, we focus on a single-angle overlap Josephson junction fabrication technique, based on the lift-off process for defining both base and top electrodes, avoiding the wiring insulator layer and requiring an RF Ar etching process before AlOx barrier growth. The fabricated Al/AlOx/Al microscale Josephson junctions have been tested at low temperature (T = 300 mK) in the superconducting state using current-voltage characteristic measurements.