In this work we theoretically investigate the responsivity/noise equivalent power (NEP) trade-off in graphene/semiconductor Schottky photodetectors (PDs) operating in the near-infrared regime and working at room temperature. Our analysis shows that the responsivity/NEP ratio is strongly dependent on the Schottky barrier height (SBH) of the junction, and we derive a closed analytical formula for maximizing it. In addition, we theoretically discuss how the SBH is related to the reverse voltage applied to the junction in order to show how these devices could be optimized in practice for different semiconductors. We found that graphene/n-silicon (Si) Schottky PDs could be optimized at 1550 nm, showing a responsivity and NEP of 133 mA/W and 500 fW/√ Hz, respectively, with a low reverse bias of only 0.66 V. Moreover, we show that graphene/n-germanium (Ge) Schottky PDs optimized in terms of responsivity/NEP ratio could be employed at 2000 nm with a responsivity and NEP of 233 mA/W and 31 pW/√ Hz, respectively. We believe that our insights are of great importance in the field of silicon photonics for the realization of Si-based PDs to be employed in power monitoring, lab-on-chip and environment monitoring applications.

Theoretical investigation of responsivity/NEP trade-off in NIR graphene/semiconductor schottky photodetectors operating at room temperature

Crisci T.;Moretti L.;
2021

Abstract

In this work we theoretically investigate the responsivity/noise equivalent power (NEP) trade-off in graphene/semiconductor Schottky photodetectors (PDs) operating in the near-infrared regime and working at room temperature. Our analysis shows that the responsivity/NEP ratio is strongly dependent on the Schottky barrier height (SBH) of the junction, and we derive a closed analytical formula for maximizing it. In addition, we theoretically discuss how the SBH is related to the reverse voltage applied to the junction in order to show how these devices could be optimized in practice for different semiconductors. We found that graphene/n-silicon (Si) Schottky PDs could be optimized at 1550 nm, showing a responsivity and NEP of 133 mA/W and 500 fW/√ Hz, respectively, with a low reverse bias of only 0.66 V. Moreover, we show that graphene/n-germanium (Ge) Schottky PDs optimized in terms of responsivity/NEP ratio could be employed at 2000 nm with a responsivity and NEP of 233 mA/W and 31 pW/√ Hz, respectively. We believe that our insights are of great importance in the field of silicon photonics for the realization of Si-based PDs to be employed in power monitoring, lab-on-chip and environment monitoring applications.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11591/463721
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