This paper describes a semantic based representation for Design Patterns, defined on the base of the formal pattern language known as ODOL, which has been corrected and ex- tended to better represent both structural and behavioural aspects of pattern descriptions. In particular, new concepts have been added to the underlying OWL ontology to en- rich the structural description of patterns, while OWL-S has been adopted to describe patterns’ behaviour by rep- resenting participants’ methods as services. Our goal is to define a new, flexible and easily extendible pattern represen- tation, which could be used to describe all aspects of Design Patterns and could be also applied to cloud computing, in particular to the description of Cloud Patterns. We pro- vide details on the defined language and considerations on its ability to describe both Design and Cloud Patterns.
Towards a Common Semantic Representation of Design and Cloud Patterns
DI MARTINO, Beniamino;ESPOSITO, ANTONIO
2013
Abstract
This paper describes a semantic based representation for Design Patterns, defined on the base of the formal pattern language known as ODOL, which has been corrected and ex- tended to better represent both structural and behavioural aspects of pattern descriptions. In particular, new concepts have been added to the underlying OWL ontology to en- rich the structural description of patterns, while OWL-S has been adopted to describe patterns’ behaviour by rep- resenting participants’ methods as services. Our goal is to define a new, flexible and easily extendible pattern represen- tation, which could be used to describe all aspects of Design Patterns and could be also applied to cloud computing, in particular to the description of Cloud Patterns. We pro- vide details on the defined language and considerations on its ability to describe both Design and Cloud Patterns.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
